Etching technique belongs to the technical field of photographic chemistry, is a method of using photolithography etching thin precision metal products. Its basic principle is to use chemical photosensitivity photosensitive material, lithography method is adopted in the base metal substrate both sides evenly coated with a photosensitive material, the film board grid produced significant shape accurately reproduce the photosensitive layer metal substrate on both sides of the mask by developing the removal of part of the photoptic mask, metal parts bare in subsequent processing and corrosion liquid spray directly contact by erosion, product technology - etching technique to finally obtain the required shape and size with high accuracy